John S. Suehle

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Affiliation: 
National Institute of Standards and Technology (NIST)

John S. Suehle received his B.S., M.S., and Ph.D. degrees in electrical engineering from the University of Maryland, College Park, in 1980, 1982, and 1988, respectively. In 1981, he received a Graduate Research Fellowship with the National Institute of Standards and Technology (NIST), Gaithersburg, MD. Since 1982, he has been working in the Semiconductor Electronics Division at NIST, where he is leader of the CMOS and Novel Devices Group.

Dr. Suehle's research activities include failure and wear-out mechanisms of semiconductor devices, radiation effects on microelectronic devices, micro-electro-mechanical-systems (MEMS), and molecular electronic devices. Dr. Suehle has published over 100 technical papers or conference proceedings and holds 5 U.S. patents.

Dr. Suehle serves as the chairman of the Oxide Integrity Working Group of the EIA/JEDEC JC 14.2 Standards Committee responsible for wafer-level reliability. His is a Senior Member of IEEE.