Kazuhiko Endo

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Affiliation: 
Advanced Industrial Science and Technology, Japan

Kazuhiko Endo is a senior researcher in the Silicon Nanoscale Devices Group, National Institute of Advanced Industrial Science and Technology, Japan.
He received a Ph. D. degree in electrical engineering from the Waseda University in 1999. His research interests include nanometer-scale manufacturing for aggressively scaled multi-gate devices in advanced VLSI technologies.
Prior to joining AIST, he was with Silicon Systems Research Laboratories, NEC Corporation from 1993 to 2003 where he worked on the research and development of multilevel interconnects and high-k gate-stack technologies for ULSI. From August 1999 to August 2000 he was a visiting scholar at the Stanford University, Center for Integrated Systems.
He is a recipient of a Best Paper Award at the 2003 Advanced Metallization Conference, and at the 1998 Meeting of Japan Society of Applied Physics.
Dr. Endo is a member of the IEEE Electron Device Society and the Japan Society of Applied Physics.