Navin Srivastava

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Affiliation: 
Mentor Graphics
Graduation Time: 
Sunday, February 1, 2009

Navin Srivastava received the Bachelor of Technology (Honors) degree in electrical engineering from the Indian Institute of Technology, Kharagpur,, India in June 2000. Subsequently he worked in the Electronic Design Automation industry for three years, first at Delsoft India Pvt. Ltd located in Noida, India, and then at (headquartered at San Jose, California). He joined Prof. Banerjee's research group at UCSB in Spring 2003 and received the MS and PhD degrees in electrical and computer engineering in 2007 and March 2009, respectively. His doctoral work was focused on the electrical issues emerging as a result of ultra high-frequencies of signals on VLSI interconnects as well as the material challenges that are presented by aggressively scaled Cu interconnects of the future. He was one of the first researchers to study the applicability of carbon nanotubes for VLSI interconnect applications. He also developed a fully analytical treatment of the high-frequency interconnect impedance extraction considering the effect of multi-layer conductive substrates that allows more than an order of magnitude speedup in extraction. His doctoral work resulted in over 20 papers in journals and refereed international conferences. He was the co-recipient of an IEEE Micro Top Picks Award for a 3D IC related paper (in ASPLOS 2006) that was selected among the 10 most significant research publications in computer architecture in 2006, as well as the co-recipient of an Outstanding Student Paper Award at the 22nd VLSI Multilevel Interconnection Conference in 2005. Since April 2009, he has been with the R&D Division of CALIBRE in Mentor Graphics Corporation, Portland, Oregon, as a Member of Technical Staff.