We have highlighted an underlying physical concept behind the BTBT process that has been mostly overlooked in literature. It has been shown that ignoring the dual nature of electrons and holes during the BTBT phenomenon can not only lead to substantially erroneous results but also to misleading...
Publications
2013
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Analytical Thermal Model for Self-Heating in Advanced FinFET Devices With Implications for Design and ReliabilityIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 32, No. xx, pp. xx-yy, 2013 (in press).
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Carbon Integrated Electronicsin Intelligent Integrated Systems: Technologies, Devices and Architectures. Ed: S. Deleonibus, WSPC-Pan Stanford (Singapore) Publishers, 2013 (in press).
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VLSI Technology and Circuitsin Guide to State-of-the-Art Electron Devices, Ed. J. Burghartz, John Wiley & Sons, Ltd, ISBN: 978-1-1183-4726-3, 2013 (in press).
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Impact-Ionization Field-Effect-Transistor Based Biosensors for Ultra-Sensitive Detection of BiomoleculesApplied Physics Letters, Vol. 102, 2013 (in press)
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Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field-Effect-Transistors
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Graphene nanoribbon based negative resistance device for ultra-low voltage digital logic applications
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Tunnel-Field-Effect-Transistor Based Gas-Sensor: Introducing Gas Detection with a Quantum-Mechanical Transducer
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Physical Modeling of the Capacitance and Capacitive Coupling-Noise of Through-Oxide Vias in FDSOI Based Ultra-High Density 3-D ICs
2012
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A Computational Study of Metal-Contacts to Beyond-Graphene 2D Semiconductor MaterialsIEEE International Electron Devices Meeting (IEDM), pp. 407-410, San Francisco, Dec. 10-12, 2012
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Fast High-Frequency Impedance Extraction of Horizontal Interconnects and Inductors in 3-D ICs with Multiple SubstratesIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 31, No. 11, pp. 1698-1710, 2012. [
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Some Clarifications on “Compact Modeling and Analysis of Through-Si-Via Induced Electrical Noise Coupling in Three-Dimensional ICs
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ESD Characterization of Atomically-Thin Graphene34th Annual EOS/ESD Symposium, pp. 1-8, Tucson, AZ, September 9-14, 2012.
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Metal to Multi-Layer Graphene Contact--Part I: Contact Resistance Modeling
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Metal to Multi-Layer Graphene Contact--Part II: Analysis of Contact Resistance
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Top Illuminated Inverted Organic UV Photosensors With Single Layer Graphene Electrodes
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NEMS based Ultra Energy-Efficient Digital ICs: Materials, Device Architectures, Logic Implementation, and ManufacturabilityChapter 10 in Microelectronics to Nanoelectronics: Materials, Devices & Manufacturability. Ed: Anupama B. Kaul, CRC Press, ISBN 9781466509542, July 2012.
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Fundamental Limitations of Conventional-FET Biosensors: Quantum-Mechanical-Tunneling to the RescueDevice Research Conference (DRC), pp. 83-84, Penn State University, University Park, PA, June 18-22, 2012.
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Fast Extraction of High-Frequency Parallel Admittance of Through-Silicon-Vias and their Capacitive Coupling-Noise to Active RegionsIEEE International Microwave Symposium, Montréal, Canada, June 17-22, 2012
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Proposal for Tunnel-Field-Effect-Transistor as Ultra-Sensitive and Label-Free Biosensors
2011
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Graphene Based Green ElectronicsInternational Workshop on Physics of Semiconductors (IWPSD), IIT-Kanpur, India, Dec 18-22, 2011.INVITED TALK
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Graphene Based Green ElectronicsIEEE Electrical Design of Advanced Packaging & Systems (EDAPS) Symposium, Hangzhou, China, Dec 12-14, 2011.KEYNOTE
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Some Results Pertaining Electromagnetic Characterization and Model Building for Passive Systems Including TSVs, for 3-D IC’s ApplicationsIEEE Electrical Design of Advanced Packaging & Systems (EDAPS) Symposium, Hangzhou, China, Dec 12-14, 2011.
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Future of Carbon Nanomaterials as Next-Generation Interconnects and Passives DevicesIEEE Electrical Design of Advanced Packaging & Systems (EDAPS) Symposium, Hangzhou, China, Dec 12-14, 2011
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Compact Capacitance and Capacitive Coupling-Noise Modeling of Through-Oxide Vias in FDSOI Based Ultra-High Density 3-D ICsIEEE International Electron Devices Meeting (IEDM), pp. 817-820, Washington DC, Dec. 5-7, 2011.
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Compact Modeling and Analysis of Through-Si-Via Induced Electrical Noise Coupling in 3-D ICs
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CMOS Compatible Vertical Silicon Nanowire Gate-All-Around p-type Tunneling FETs with ≤50 mV/decade Subthreshold Swing
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Vertically Stacked and Independently Controlled Twin-Gate MOSFETs on a Single Si-Nanowire
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Synthesis of High-Quality Monolayer and Bilayer Graphene on Copper using Chemical Vapor Deposition
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A Physical Model for Work-Function Variation in Ultra-Short Channel Metal-Gate MOSFETs
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A Fully Analytical Model for the Series Impedance of Through-Silicon Vias with Consideration of Substrate Effects and Coupling with Horizontal Interconnects
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Metallic-Nanoparticle Assisted Enhanced Band-to-Band Tunneling Current
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Carbon Nanotube Vias: Does Ballistic Electron-Phonon Transport Imply Improved Performance and Reliability?
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Grain-Orientation Induced Quantum Confinement Variation in FinFETs and Multi-Gate Ultra-Thin Body CMOS Devices and Implications for Digital DesignIEEE Transactions on Electron Devices, Special Issue on "Characterization of Nano CMOS Variability by Simulation and Measurements," vol. 58, no. 8, pp. 2282-2292, Aug. 2011. [
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Demonstration of Vertical Silicon Nanowire Tunnel Field Effect Transistor with Low Subthreshold Slope < 50mV/decadeInternational Conference on Materials for Advanced Technologies (ICMAT), Singapore, June 26-July 1, 2011.
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Impact of Scaling on the Performance and Reliability Degradation of Metal-Contacts in NEMS DevicesIEEE International Reliability Physics Symposium (IRPS), Monterey, CA, April 10-14, pp. 280-289, 2011.
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Vertical Si-Nanowire n-Type Tunneling FETs With Low Subthreshold Swing (≤ 50 mV/decade) at Room Temperature
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Carbon Based Green ElectronicsACM/IEEE International Workshop on Timing Issues in the Specification and Synthesis of Digital Systems (TAU 2011), Santa Barbara, CA, March 31-April 1, 2011.KEYNOTE
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High-Frequency Behavior of Graphene-Based Interconnects—Part II: Impedance Analysis and Implications for Inductor Design
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High-Frequency Behavior of Graphene-Based Interconnects—Part I: Impedance Modeling
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Factors Influencing the Synthesis of Monolayer and Bilayer Graphene on Copper using Chemical Vapor Deposition38th Conference on the Physics and Chemistry of Surfaces and Interfaces (PCSI-38), San Diego, CA, January 16-20, 2011.
2010
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Electron-hole Duality During Band-to-Band Tunneling Process in Graphene-Nanoribbon Tunnel-Field-Effect Transistors
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A Quantitative Inquisition into ESD Sensitivity to Strain in Nanoscale CMOS Protection DevicesIEEE International Electron Devices Meeting (IEDM), San Francisco, CA, Dec. 6-8, pp. 808-811, 2010.
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Compact Modeling and Analysis of Coupling Noise Induced by Through-Si-Vias in 3-D ICsIEEE International Electron Devices Meeting (IEDM), San Francisco, CA, Dec. 6-8, pp. 178-181, 2010.
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Compact AC Modeling and Performance Analysis of Through-Silicon Vias (TSVs) in 3-D ICs
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Carbon-Based Green ElectronicsMaterials Research Society (MRS) Fall Symposium, Boston, MA, Nov. 29-Dec. 3, 2010. (INVITED)
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Work-function variation induced fluctuation in bias-temperature-instability characteristics of emerging metal-gate devices and implications for digital designACM/IEEE International Conf. on Computer-Aided Design (ICCAD), pp. 714-720, San Jose, CA, Nov. 5-8, 2010.
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Design Optimization of FinFET Domino Logic Considering the Width Quantization Property
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A Thermal Simulation Process Based on Electrical. Modeling for Complex Interconnect, Packaging and 3DI Structures
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A Novel Enhanced Electric-Field Impact-Ionization MOS Transistor
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A Novel Variation-Tolerant Keeper Architecture for High-Performance Low-Power Wide Fan-in Dynamic Gates
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Grain-Orientation Induced Work-Function Variation in Nanoscale Metal-Gate Transistors––Part II: Implications for Process, Device, and Circuit Design
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Grain-Orientation Induced Work-Function Variation in Nanoscale Metal-Gate Transistors––Part I: Modeling, Analysis, and Experimental Validation
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A New Paradigm in the Design of Energy-Efficient Digital Circuits Using Laterally-Actuated Double-Gate NEMSIEEE International Symposium on Low Power Electronics and Design (ISLPED), Austin, TX, August 18-20, pp. 7-12, 2010.
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Prospects of Carbon Nanomaterials for Next-Generation Green ElectronicsIEEE NANO, Kintex, Seoul, August 17-20, pp. 1-6, 2010.
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Accurate Calculations of the High-frequency Impedance Matrix for VLSI Interconnects and Inductors above a Multi-layer Substrate: A VARPRO success storyin Exponential Data Fitting and its Applications, Editors: V. Pereyra and G. Scherer. Bentham Science Publishers, ISBN: 978-1-60805-048-2, 2010.
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Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICsIEEE Design and Test of Computers, Special Issue on Emerging Interconnect Technologies for Gigascale Integration, pp. 20-31, July/August, 2010. [
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INVITED -
Effect of Grain Orientation on NBTI Variation and Recovery in Emerging Metal-Gate Devices
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Compact AC Modeling and Performance Analysis of Through-Silicon Vias (TSVs) in 3-D ICs28th Progress In Electromagnetics Research Symposium (PIERS), Cambridge, MA, pp.1-2, 2010
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Graphene Based Heterostructure Tunnel-FETs for Low-Voltage/High-Performance ICsin Proceedings 68th Device Research Conference (DRC), Notre Dame, IN, June 21-23, 2010, pp. 65-66.
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CAD for Nanoelectronics: Earlier the BetterIEEE/ACM International Symposium on Nanoscale Architectures (NANOARCH’08), June 17-18, 2010, Anaheim, CA PANEL: CAD for Nanoelectronic Circuits and Architectures – Are we there yet?
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Design and Analysis of Compact Ultra Energy-Efficient Logic Gates Using Laterally-Actuated Double-Electrode NEMSDesign Automation Conference (DAC), Anaheim, CA, June 13-18, 2010, pp. 893-896.
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An Efficient 3D Green’s Function Approach for Fast Impedance Extraction of Interconnects and Spiral Inductors in CMOS RF/Millimeter-wavelength CircuitsIEEE International Interconnect Technology Conference (IITC), San Francisco, CA, June 7-9, pp. 1-3, 2010.
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AC Conductance Modeling and Analysis of Graphene Nanoribbon Interconnectsin Proceedings 13th IEEE International Interconnect Technology Conference (IITC), San Francisco, CA, June 7-9, pp.1-3, 2010.
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A Built-in Aging Detection and Compensation Technique for Improving Reliability of Nanoscale CMOS DesignsIEEE International Reliability Physics Symposium (IRPS), May 2-6, Anaheim, CA, pp. 822-825, 2010.
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Corrections to “Analytical Expressions for High-Frequency VLSI Interconnect Impedance Extraction in the Presence of a Multilayer Conductive Substrate”IEEE Transactions on Computer Aided Design of Integrated Circuits and Systems, Vol. 29, No. 5, pp. 849-849, May 2010. [
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Carbon based Nanomaterials as Interconnects and Passives for Next-Generation VLSI and 3-D ICsIEEE WMED, Boise, Idaho, April 16, 2010INVITED TUTORIAL
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Carbon Based Active and Passive Devices for Next-Generation ICsUltimate Limit of Integration in Silicon (ULIS), Glasgow, Scotland, March 17-19, 2010.INVITED--PLENARY
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Efficient 3D High-frequency Impedance Extraction for General Interconnects and Inductors Above a Layered SubstrateDesign and Test in Europe (DATE), Dresden, Germany March 8-12, pp. 459-464, 2010.
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Aging-Resilient Design of Pipelined Architectures using Novel Detection and Correction CircuitsDesign and Test in Europe (DATE), Dresden, Germany March 8-12, pp. 244-249, 2010.
2009
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Single wall carbon nanotube-Aptamer Based Biosensors7 th International Symposium on Bioscience and Nanotechnology, Tokyo, Japan, December 20-21, 2009.
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Carbon Nanomaterial based Interconnects and Passives for Next-Generation ICsXVth International Workshop on Physics of Semiconductor Devices (IWPSD), New Delhi India, Dec. 15-19, 2009
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Compact AC Modeling and Analysis of Cu, W, and CNT based Through-Silicon Vias (TSVs) in 3-D ICsIEEE International Electron Devices Meeting (IEDM), Baltimore, Dec. 6-9, 2009
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Impact of Strain Engineering and Channel Orientation on the ESD Performance of Nanometer Scale CMOS DevicesIEEE International Electron Devices Meeting (IEDM), Baltimore, Dec. 6-9, 2009
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Green Electronics using Graphene based NanomaterialsEmerging Technologies in Solid State Devices Workshop, Baltimore, MD, December 5 - 6, 2009
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Experimental Investigation of ESD Performance for Strained Silicon Nano-DevicesESD Forum, Berlin, Dec. 1-2, 2009
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Fast 3-D Thermal Analysis of Complex Interconnect Structures Using Electrical Modeling and Simulation MethodologiesInternational Conf. on Computer-Aided Design (ICCAD), San Jose, Nov. 2-5, pp. 658-665, 2009
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Variability Analysis of FinFET-Based Devices and Circuits Considering Electrical Confinement and Width QuantizationInternational Conf. on Computer-Aided Design (ICCAD), San Jose, Nov. 2-5, pp. 505-512, 2009
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Hybrid NEMS-CMOS Integrated Circuits: A Novel Strategy for Energy-Efficient DesignsIET Transactions on Computers and Digital Techniques—Special Issue on Advances in Nanoelectronics Circuits and Systems, Vol. 3, No. 6, pp. 593-608, Nov. 2009 [
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Steep Subthreshold Slope n- and p-type Tunnel-FET Devices for Low-Power and Energy-Efficient Digital Circuits
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Carbon Based Active and Passive Devices for Next-Generation ICsGlobal COE International Symposium on Silicon Nano Devices in 2030: Prospects by World’s Leading Scientists, Oct. 13-14, Tokyo, 2009
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Carbon Nanomaterials for Next-Generation Interconnects and Passives: Physics, Status and ProspectsInternational Conference on Solid State Devices and Materials (SSDM), Sendai, Japan, Oct. 7-9, 2009
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High-Frequency Analysis of Carbon Nanotube Interconnects and Implications for On-Chip Inductor Design
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Carbon Nanomaterials for Next-Generation Interconnects and Passives: Physics, Status and ProspectsIEEE Transactions on Electron Devices, Special Issue on Compact Interconnect Models for Gigascale Integration, Vol. 56, No. 9, pp. 1799-1821, Sep 2009. [
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INVITED AND HIGHLIGHTED ON THE JOURNAL COVERPAGE -
Prospects of Carbon Nanomaterials in VLSI for Interconnections and Energy Storage31st Annual EOS/ESD Symposium, Anaheim, CA, Aug 30-Sept 4, 2009
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An Analytical Treatment of High-frequency Impedance Extraction for Interconnects and Inductors in the Presence of a Multi-layer SubstrateProgress in Electromagnetics Research Symposium (PIERS), Moscow, Russia, August 18-21, 2009
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Carbon Nanomaterials for Next-Generation Interconnects and Passives: Physics, Status and ProspectsProgress in Electromagnetics Research Symposium (PIERS), Moscow, Russia, August 18-21, 2009
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Modeling, Analysis and Design of Graphene Nano-Ribbon Interconnects
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Graphene Based Nanomaterials for VLSI Interconnect and Energy-Storage ApplicationsACM/IEEE System Level Interconnect Prediction (SLIP), San Francisco, CA, July 26, 2009INVITED PANEL
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Analytical Expressions for High-Frequency VLSI Interconnect Impedance Extraction in the Presence of a Multi-layer Conductive SubstrateIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 28, No. 7, pp. 1047-1060, July 2009 [
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On the Applicability of Single-Walled Carbon Nanotubes as VLSI Interconnections
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Scaling Analysis of Graphene Nanoribbon Tunnel-FETsDevice Research Conference (DRC), pp. 217-218, Penn State University, University Park, PA, June 22-24, pp. 217-218, 2009
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Carbon Nanomaterials for Next Generation Interconnects and Passives: Physics, Status and ProspectsInternational Electrostatic Discharge Workshop (IEW), Lake Tahoe, CA, May 18-21, 2009KEYNOTE
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Graphene Based Transistors: Physics, Status and Future PerspectivesInternational Symposium on Physical Design (ISPD), San Diego, CA, March 29-April 1
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Carbon Nanomaterials for Next Generation Interconnects and Passives: Physics, Status and Prospects18th Materials for Advanced Metallization Conference (MAM), Grenoble, France, March 8-11
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CMOS vs. Nano: Comrades or Rivals?17th ACM/SIGDA International Symposium on Field-Programmable Gate Arrays (FPGA), Monterey, CA, Feb 22-24 Panel: CMOS vs. Nano: Comrades or Rivals?INVITED PANEL
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High-Speed Low-Power FinFET Based Domino Logic14th Asia and South Pacific Design Automation Conference (ASP-DAC), Yokohama, Japan, Jan. 19-22, 2009
2008
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Modeling and Analysis of Grain-Orientation Effects in Emerging Metal-Gate Devices and Implications for SRAM ReliabilityIEEE International Electron Devices Meeting (IEDM), pp. 705-708, San Francisco, Dec. 15-17, 2008
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Scaling and Variability Analysis of CNT-Based NEMS Devices and Circuits with Implications for Process DesignIEEE International Electron Devices Meeting (IEDM), pp. 529-532, San Francisco, Dec. 15-17, 2008
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High-Frequency Effects in Carbon Nanotube Interconnects and Implications for On-Chip Inductor Design
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Graphene Nano-Ribbon (GNR) Interconnects: A Genuine Contender or a Delusive Dream?
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Accurate Intrinsic Gate Capacitance Model for Carbon Nanotube-Array Based FETs Considering Screening Effect
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Statistical Modeling of Metal-Gate Work-Function Variability in Emerging Device Technologies and Implications for Circuit DesignIEEE International Conference on Computer-Aided Design (ICCAD), pp. 270-277, San Jose, Nov. 10-13, 2008Nominated for the BEST PAPER AWARD
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A Design-Specific and Thermally-Aware Methodology for Trading-off Power and Performance in Leakage-Dominant CMOS TechnologiesIEEE Transactions on Very Large Scale Integration Systems, Vol. 16, No. 11, pp. 1488-1498, Nov. 2008 [
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Current Status and Future Perspectives of Carbon Nanotube InterconnectsIEEE EMC Symposium, Detroit, MI, August 18-22, 2008. (INVITED)
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Current Status and Future Perspectives of Carbon Nanotube InterconnectsIEEE NANO: 8th International Conference on Nanotechnology, pp. 432-436, Arlington, TX, August 18-21, 2008 [
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Carbon Nanotube Interconnects for Next Generation ICsSummer School on Nanoelectronic Circuits and Tools, EPFL, Lausanne, Switzerland, July 14-18, 2008INVITED
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Hybrid NEMS-CMOS CircuitsIEEE/ACM International Symposium on Nanoscale Architectures (NANOARCH’08), June 12-13, 2008, Anaheim, CA Panel: Non-CMOS NanoElectronics – Will it ever be real?INVITED PANEL
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Analysis and Implications of Parasitic and Screening Effects on the High-Frequency/RF Performance of Tunneling-Carbon Nanotube FETsIEEE/ACM Design Automation Conference (DAC), Anaheim, CA, June 8-13, pp. 250-255, 2008
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Circuit Modeling and Performance Analysis of Multi-Walled Carbon Nanotube Interconnects
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High-Frequency Effects in Carbon Nanotube Interconnects12th IEEE Workshop on Signal Propagation on Interconnects (SPI), Avignon, Pope's Palace, France, May 12-15, 2008KEYNOTE
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3D Device Modeling of Damage Due to Filamentation Under an ESD Event in Nanometer Scale Drain Extended NMOS (DE-NMOS)IEEE International Reliability Physics Symposium (IRPS), pp. 639-640, Phoenix, AZ, April 27-May 1, 2008
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High-Frequency Mutual Impedance Extraction of VLSI Interconnects in the Presence of a Multi-layer Conducting SubstrateIEEE Design and Test in Europe (DATE), pp.42-431, Munich, Germany, March 10-14, 2008
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Cool Chips: Opportunities and Implications for Power and Thermal ManagementIEEE Transactions on Electron Devices, Special Issue on Device Technologies and Circuit Techniques for Power Management, Vol. 55, No. 1, pp. 245-255, 2008 [
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HIGHLIGHTED ON THE JOURNAL COVER -
Thermal Challenges of 3-D ICsin Wafer Level 3-D ICs Process Technology, Editors: Chuan Seng Tan, Ronald J. Gutmann, L. Rafael Reif, Springer,ISBN: 978-0-387-76532-7, 2008
2007
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Power and Thermal Management in the Nanometer EraIEEE CPMT EDAPS, Taipei, Taiwan, December 15-17, 2007
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Performance Analysis of Multi-Walled Carbon Nanotube Based InterconnectsIEEE International Semiconductor Device Research Symposium (ISDRS), pp. 1-2, College Park, MD, December 12-14, 2007
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Modeling and Analysis of Intrinsic Gate Capacitance for Carbon Nanotube Array Based Devices Considering Variaion in Screening Effect and DiameterIEEE International Semiconductor Device Research Symposium (ISDRS), pp. 1-2, College Park, MD, December 12-14, 2007
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A Fast Semi-numerical Technique for the Solution of the Poisson-Boltzmann Equation in a Cylindrical NanowireIEEE International Semiconductor Device Research Symposium (ISDRS), pp. 1-2, College Park, MD, December 12-14, 2007
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Carbon Nanotube Vias: A Reality Check
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Modeling and Analysis of Self-Heating in FinFET Devices for Improved Circuit and EOS/ESD PerformanceIEEE International Electron Devices Meeting (IEDM), pp. 177-180, Washington DC, Dec. 10-12, 2007
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A Microscopic Understanding of Nanometer Scale DENMOS Failure Mechanism Under ESD ConditionsIEEE International Electron Devices Meeting (IEDM), pp. 181-184, Washington DC, Dec. 10-12, 2007
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A Self-Consistent Substrate Thermal Profile Estimation Technique for Nanoscale ICs—Part II: Implementation and Implications for Power Estimation and Thermal Management
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A Self-Consistent Substrate Thermal Profile Estimation Technique for Nanoscale ICs—Part I: Electrothermal Couplings and Full-Chip Package Thermal Model
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A Statistical Framework for Estimation of Full-Chip Leakage-Power Distribution under Parameter Variations
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Design and Analysis of Hybrid NEMS-CMOS Circuits for Ultra Low-Power ApplicationsIEEE/ACM Design Automation Conference (DAC), pp. 306-311, San Diego, CA, June 4-8, 2007
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Nano-enhanced Architectures: Using Carbon Nanotube Interconnects in Cache Design4th Workshop on Non-Silicon Computing (NSC-4) held in conjunction with the International Symposium on Computer Architecture (ISCA'07 workshop), San Diego, California, June 2007
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An Insight into the High Current ESD Behavior of Drain Extended NMOS (DENMOS) Devices in Nanometer Scale CMOS TechnologiesIEEE International Reliability Physics Symposium (IRPS), pp. 608-609, Phoenix, AZ, April 15-19, 2007
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Electrothermal Engineering in the Nanometer Era17th ACM Great Lakes Symposium on VLSI (GLSVLSI), Stresa-Lago Maggiore, Italy, March 11-13, 2007INVITED TUTORIAL
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SoC Communication Architectures: Technology, Current Practice, Research and TrendsVLSI Design Conference, Bangalore, India, Jan. 6-10, 2007INVITED TUTORIAL
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3D-Integration for IntrospectionIEEE Micro: Micro's Top Picks from Computer Architecture Conferences (IEEE Micro - top pick), pp. 77-83, January-February 2007 [
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2006
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Can Carbon Nanotubes Extend the Lifetime of On-Chip VLSI Interconnections?IEEE-CPMT Electrical Design of Advanced Packaging Systems (EDAPS), Shanghai, China, December 17-19, 2006
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Power and Thermal Challenges for 65 nm and BelowIEEE International Conference on Computer-Aided Design (ICCAD), San Jose, CA, Nov. 5-9, 2006INVITED TUTORIAL
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An Electrothermally-Aware Full-Chip Substrate Temperature Gradient Evaluation Methodology for Leakage Dominant Technologies with Implications for Power Estimation and Hot-Spot ManagementIEEE International Conference on Computer-Aided Design (ICCAD), pp. 568-574, San Jose, CA, Nov. 5-9, 2006 [
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What are Carbon Nanotubes?ACM SIGDA Newsletter, Vol. 36, No. 21, Nov. 2006
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Introspective 3-D ChipsInternational Conference on Architectural Support for Programming Languages and Operating Systems (ASPLOS), pp. 264-273, San Jose, CA, Oct. 25-25, 2006 [
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IEEE MICRO Top Pick -
Carbon Nanotubes: An Emerging Alternative for On-Chip VLSI InterconnectsFuture Directions in IC and Package Design Workshop, (FDIP), Scottsdale, AZ, Oct. 22, 2006
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Thermal Dissipation in Multilayer Devices23rd Advanced Metallization Conference, San Diego, CA, Oct. 16-19, 2006
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Modeling and Extraction of Nanometer Scale Interconnects: Challenges and Opportunities
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Prospects for Carbon Nanotube Interconnects23rd Advanced Metallization Conference (AMC), San Diego, CA, Oct. 16-19, 2006
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Can Carbon Nanotubes Extend the Lifetime of On-Chip Electrical Interconnections?IEEE Conference on Nano Networks (Nano-Net), Lausanne, Switzerland, Sept. 14-16, 2006
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Are Carbon Nanotubes the Future of VLSI Interconnections?
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A Novel Variation-Aware Low-Power Keeper Architecture for Wide Fan-in Dynamic Gates
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A Thermally-Aware Performance Analysis of Vertically Integrated (3-D) Processor-Memory Hierarchy
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Emerging Interconnect Technologies based on Carbon NanotubesIEEE International Symposium on Quality Electronic Design (ISQED), San Jose, CA, March 27-29, 2006INVITED TUTORIAL
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Electrothermal Engineering in the Nanometer Era: From Devices and Interconnects to Circuits and SystemsAsia and South Pacific Design Automation Conference (ASP-DAC), pp. 223-230, Yokohama, Japan, Jan. 24-27, 2006 [
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2005
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Analysis and Implications of IC Cooling for Deep Nanometer Scale CMOS TechnologiesHIGHLIGHTED PAPER OF IEDM 2005
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Carbon Nanotube Interconnects: Implications for Performance, Power Dissipation and Thermal Management
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New Physical Insight and Modeling of Second Breakdown (It2) Phenomenon in Advanced ESD Protection Devices
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Scaling Analysis of Multilevel Interconnect Temperatures in High Performance ICs
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Performance Analysis of Carbon Nanotube Interconnects for VLSI ApplicationsIEEE International Conference on Computer-Aided Design (ICCAD), pp. 383-390, San Jose, CA, November 6-10, 2005 [
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Thermal Scaling Analysis of Multilevel Cu/Low-k Interconnect Structures in Deep Nanometer Scale TechnologiesProceedings of the 22nd International VLSI Multilevel Interconnect Conference (VMIC), pp. 525-530, Fremont, CA, October 3-6, 2005 [
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OUTSTANDING STUDENT PAPER AWARD -
A Thermally Aware Methodology for Design-Specific Optimization of Supply and Threshold Voltages in Nanometer Scale ICsIEEE International Conference on Computer Design (ICCD), pp. 411-416, San Jose, October 2-5, 2005 [
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Interconnect Modeling and Analysis in the Nanometer Era: Cu and Beyond
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Thermal Modeling of Bonded SOI/3D ICsAdvanced Metallization Conference (AMC), pp. 25-31, Colorado Springs, CO. Sept. 26-29, 2005
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Supply and Power Optimization in Leakage Dominant TechnologiesIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 24, No. 9, pp. 1362-1371, 2005 [
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A Probabilistic Framework for Power-Optimal Repeater Insertion for Global Interconnects Under Parameter VariationsInternational Symposium on Low Power Electronic Design (ISLPED), pp. 131-136, San Diego, CA, August 8-10, 2005 [
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Nominated for the BEST PAPER AWARD -
Modeling and Analysis of Non-Uniform Substrate Temperature Effects on Global ULSI InterconnectsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 24, No. 6, pp. 849-861, 2005 [
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Mechanisms Leading to Erratic Snapback Behavior in Bipolar Junction Transistors with Base Emitter Shorted
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Impact of On-Chip Inductance on Power Distribution Network Design for Nanometer Scale Integrated CircuitsIEEE International Symposium on Quality Electronic Design, pp. 346-351, San Jose, CA, March 21-23, (ISQED), 2005, [
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Scaling Analysis of On-Chip Power Grid Voltage Variations in Nanometer Scale ULSIInternational Journal of Analog Integrated Circuits and Signal Processing, Vol. 42, No. 3, pp. 277-290, Springer, 2005 [
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Emerging Nanoelectronics: Life With and After CMOS, Vol. 3Springer (Kluwer), ISBN: 1-4020-7916-8, 428 pp. (2005)
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Emerging Nanoelectronics: Life With and After CMOS, Vol. 2Springer (Kluwer), ISBN: 1-4020-7915-X, 340 pp. (2005)
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Emerging Nanoelectronics: Life With and After CMOS, Vol. 1,Springer (Kluwer), ISBN: 1-4020-7533-2, 622 pp. (2005)
2004
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Analytical Modelling of Single Electron Transistor (SET) for Hybrid CMOS-SET Analog IC Design
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Leakage and Variation Aware Thermal Management of Nanometer Scale ICsProceedings of the IMAPS-Advanced Technology Workshop on Thermal Management, Oct. 25-27, Palo Alto, CA, 2004 [
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Interconnect Challenges for Nanoscale Electronic CircuitsTMS Journal of Materials (JOM), Special Issue on Nanoelectronics, Vol. 56, No. 10, pp. 30-31, October 2004 [
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INVITED -
A Comparative Scaling Analysis of Metallic and Carbon Nanotube Interconnections for Nanometer Scale VLSI TechnologiesProceedings of the 21st International VLSI Multilevel Interconnect Conference (VMIC), pp. 393-398, Hawaii, Sept. 29-Oct. 2, 2004 [
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Nanometer Scale Interconnect ChallengesState-Of-The-Art Seminar, 21st International VLSI Multilevel Interconnection Conference (VMIC), Hawaii, Sept. 29-Oct. 2, 2004
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A Probabilistic Framework to Estimate Full-Chip Subthreshold Leakage Power Distribution Considering Within-Die and Die-to-Die P-T-V VariationsInternational Symposium on Low Power Electronic Design (ISLPED), pp. 156-161, Newport Beach, CA, August 9-11, 2004 [
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Simultaneous Optimization of Supply and Threshold Voltages for Low-Power and High-Performance Circuits in the Leakage Dominant Era
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Modeling Techniques and Verification Methodologies for Substrate Coupling Effects in Mixed-Signal System-on-Chip DesignsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 23, No. 6, pp. 823-836, 2004 [
]
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Impact of Off-state Leakage Current on Electromigration Design Rules for Nanometer Scale CMOS TechnologiesIEEE Annual International Reliability Physics Symposium (IRPS), pp. 74-78, Phoenix, AZ, April 25-29, 2004 [
]
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Power Supply Optimization in Sub-130 nm Leakage Dominant TechnologiesIEEE International Symposium on Quality Electronic Design (ISQED), pp. 409-414, San Jose, CA, March 22-24, 2004 [
]
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A Comprehensive Analytical Capacitance Model of a Two Dimensional Nanodot ArrayIEEE International Symposium on Quality Electronic Design (ISQED), pp. 259-264, San Jose, CA, March 22-24, 2004 [
]
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A Global Interconnect Optimization Scheme for Nanometer Scale VLSI with Implications for Latency, Bandwidth and Power Dissipation
2003
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3D ICs DSM Interconnect Performance Modeling and Analysisin Interconnect Technology and Design for Gigascale Integration, Editors: Jeffrey A. Davis and James D. Meindl, Springer, ISBN: 1-4020-7606-1, 2003
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A Self-Consistent Junction Temperature Estimation Methodology for Nanometer Scale ICs with Implications for Performance and Thermal ManagementIEEE International Electron Devices Meeting (IEDM), pp. 887-890, Washington DC, December 7-10, 2003 [
]
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SETMOS: A Novel True Hybrid SET-CMOS High Current Coulomb Blockade Oscillation Cell for Future Nano-Scale Analog ICsIEEE International Electron Devices Meeting (IEDM), pp. 703-706, Washington DC, December 7-10, 2003 [
]
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Nano, Quantum, and Molecular Computing: Are we Ready for the Validation and Test Challenges?IEEE International High Level Design Validation and Test Workshop, pp. 3-7, November 12-14, San Francisco, CA, 2003 [
]
INVITED -
A CAD Framework for Co-Design and Analysis of CMOS-SET Hybrid Integrated CircuitsIEEE International Conference on Computer-Aided Design (ICCAD), pp. 497-502, San Jose, CA, November 9-13, 2003 [
]
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Nanometer Scale Issues for On-Chip InterconnectionsIUMRS-ICAM, Symposium B-1, Si-LSI-Related Materials, Processes and Characterization Technology, Yokohama, Japan, October 8-13, 2003INVITED
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Thermal Issues in Designing Nanometer Scale Interconnects20th International VLSI Multilevel Interconnection Conference (VMIC), Marina Del Rey, CA, September 22-25, 2003INVITED
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A SET Quantizer Circuit Aiming at Digital Communication SystemIEEE International Symposium on Circuits and Systems (ISCAS), pp. 860-863, Scottsdale, AZ, May 26-29, 2003 [
]
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Teaching Microelectronics in the Silicon ICs Showstopper Zone: A Course on Ultimate Devices and Circuits: Towards Quantum Electronics4th European Workshop on Microelectronics Education (EWME), Baiona, Mancomunidad de Vigo, Spain, May 23-24, 2003 [
]
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An Interconnect Scaling Scheme with Constant On-Chip Inductive EffectsInternational Journal of Analog Integrated Circuits and Signal Processing, Vol. 35, pp. 97–105, 2003 [
]
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Modeling of Temperature Dependent Contact Resistance for Analysis of ESD Reliability41st IEEE Annual International Reliability Physics Symposium (IRPS), pp. 249-255, Dallas, TX, March 30-April 4, 2003 [
]
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Analysis of IR-Drop Scaling with Implications for Deep Submicron P/G Network DesignsIEEE International Symposium on Quality Electronic Design (ISQED), pp. 35-40, San Jose, CA, March 24-26, 2003 [
]
2002
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Via Design and Scaling Strategy for Nanometer Scale Interconnect TechnologiesTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 587-590, San Francisco, December 8-11, 2002 [
]
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Non-uniform Conduction Induced Reverse Channel Length Dependence of ESD Reliability for Silicided NMOS TransistorsTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 341-344, San Francisco, December 8-11, 2002 [
]
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Modeling and Analysis of Power Dissipation in Single Electron LogicTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 323-326, San Francisco, December 8-11, 2002 [
]
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Impact of Gate-to-Contact Spacing on ESD Performance of Salicided Deep Submicron NMOS Transistors
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Analysis of Nonuniform ESD Current Distribution in Deep Submicron NMOS Transistors
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Analysis and Optimization of Substrate Noise Coupling in Single-Chip RF Transceiver DesignIEEE International Conference on Computer-Aided Design (ICCAD), pp. 309-316, San Jose, CA, November 10-14, 2002 [
]
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A Power-Optimal Repeater Insertion Methodology for Global Interconnects in Nanometer Designs
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Quasi-Analytical Modeling of Drain Current and Conductance of Single Electron Transistors with MIB32nd European Solid-State Device Research Conference (ESSDERC), pp. 391-394, Florence, Italy, September 24-26, 2002 [
]
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Analysis of On-Chip Inductance Effects for Distributed RLC InterconnectsIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Vol. 21, No. 8, pp. 904-915, August 2002 [
]
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Analysis and Design of Distributed ESD Protection Circuits for High-Speed Mixed-Signal and RF ICs
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Power Dissipation Issues in Interconnect Performance Optimization for Sub-180 nm Designs
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Few Electron Devices: Towards Hybrid CMOS-SET Integrated CircuitsINVITED
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Analysis of Gate-Bias-Induced Heating Effects in Deep-Submicron ESD Protection Designs
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A Quasi-Analytical SET Model for Few Electron Circuit Simulation
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SET-based Quantiser Circuit for Digital Communications
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Investigation of Gate to Contact Spacing Effect on ESD Robustness of Salicided Deep Submicron Single Finger NMOS Transistors40th IEEE Annual International Reliability Physics Symposium (IRPS), pp. 148-155, Dallas, TX, April 8-11, 2002 [
]
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Modeling and Analysis of Via Hot Spots and Implications for ULSI Interconnect Reliability40th IEEE Annual International Reliability Physics Symposium (IRPS), pp. 336-345, Dallas, TX, April 8-11, 2002 [
]
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Modeling and Design of a Low-Voltage SOI Suspended-Gate MOSFET (SG-MOSFET) with a Metal Over-Gate-ArchitectureIEEE International Symposium on Quality Electronic Design (ISQED), pp. 496-501, San Jose, CA, March 18-21, 2002 [
]
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Inductance Aware Interconnect ScalingIEEE International Symposium on Quality Electronic Design (ISQED), pp. 43-47, San Jose, CA, March 18-21, 2002 [
]
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3-D Integrable Optoelectronic Devices for Telecommunications ICsIEEE International Solid State Circuits Conference (ISSCC), pp. 360-361, San Francisco, CA, February, 4-6, 2002 [
]
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Analytical Thermal Model for Multilevel VLSI Interconnects Incorporating Via Effect
2001
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Gate Bias Induced Heating Effect and Implications for the Design of Deep Submicron ESD ProtectionTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 315-318, Washington, DC, December 3-5, 2001 [
]
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Localized Heating Effects and Scaling of Sub-0.18 Micron CMOS DevicesTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 677-680, Washington, DC, December 3-5, 2001 [
]
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Analysis of Substrate Thermal Gradient Effects on Optimal Buffer InsertionIEEE International Conference on Computer-Aided Design (ICCAD), pp. 44-48, San Jose, CA, November 4-8, 2001 [
]
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Coupled Analysis of Electromigration Reliability and Performance in ULS1 Signal NetsIEEE International Conference on Computer-Aided Design (ICCAD), pp. 158-164, San Jose, CA, November 4-8, 2001 [
]
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Compact Modeling and SPICE-Based Simulation for Electrothermal Analysis of Multilevel ULSI InterconnectsIEEE International Conference on Computer-Aided Design (ICCAD), pp. 165-172, San Jose, CA, November 4-8, 2001 [
]
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Analysis and Optimization of Distributed ESD Protection Circuits for High-Speed Mixed Signal and RF Applications
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Interconnect Reliability under ESD Conditions: Physics, Models and Design Guidelines
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Global (Interconnect) WarmingINVITED
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Analysis of Non-Uniform Temperature-Dependent Interconnect Performance in High Performance ICs
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Analysis of On-Chip Inductance Effects using a Novel Performance Optimization Methodology RT-Distributed RLC InterconnectsBEST PAPER AWARD
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Accurate Analysis of On-Chip Inductance Effects and Implications for Optimal Repeater Insertion and Technology Scaling
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Non-Uniform Chip-Temperature Dependent Signal Integrity
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A New Analytical Thermal Model for Multilevel VLSI Interconnects Incorporating Via EffectsIEEE International Interconnect Technology Conference (IITC), pp. 92-94, San Francisco, CA, June 4-6, 2001 [
]
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RF LDMOS Characterization and Its Compact Modeling
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3-D Heterogeneous ICs: A Technology for the Next Decade and Beyond
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A Fast Analytical Technique for Estimating the Bounds of On-Chip Clock Wire Inductance
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Effects of Non-Uniform Substrate Temperature on the Clock Signal Integrity in High Performance Designs
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3-D ICs: A Novel Chip Design for Improving Deep Submicrometer Interconnect Performance and Systems-on-Chip IntegrationProceedings of the IEEE, Special Issue, Interconnections- Addressing The Next Challenge of IC Technology, Vol. 89, No. 5, pp. 602-633, May 2001 [
]
INVITED -
Non-uniform Bipolar Conduction in Single Finger NMOS Transistors and Implications for Deep Submicron ESD Design39th IEEE Annual International Reliability Physics Symposium (IRPS), pp. 226-234, Orlando, FL, April 30-May 3, 2001 [
]
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Analysis and Optimization of Thermal Issues in High-Performance VLSIACM/SIGDA International Symposium on Physical Design (ISPD), pp. 230-237, Sonoma, CA, April 1-4, 2001 [
]
INVITED -
Analysis and Design of ESD Protection Circuits for High-Frequency/RF ApplicationsIEEE International Symposium on Quality Electronic Design (ISQED), pp. 117-122, San Jose, CA, March 26-28, 2001 [
]
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Trends for ULSI Interconnections and Their Implications for Thermal, Reliability and Performance IssuesSeventh International Dielectrics and Conductors for ULSI Multilevel Interconnection Conference (DCMIC), pp. 38-50, Santa Clara, CA, March 5-9, 2001 [
]
INVITED -
Interconnect Limits on Gigascale Integration (GSI) in the 21st CenturyProceedings of the IEEE, Special Issue on Limits of Semiconductor Technology, Vol. 89, No. 3, pp. 305- 324, March 2001 [
]
INVITED
2000
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Full Chip Thermal Analysis of Planar (2-D) and Vertically Integrated (3-D) High Performance ICsTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 727-730, San Francisco, CA, Dec. 11-13, 2000 [
]
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Effect of Via Separation and Low-k Dielectric Materials on the Thermal Characteristics of Cu InterconnectsTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 261-264, San Francisco, CA, Dec. 11-13, 2000 [
]
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Thermal Effects in ULSI InterconnectsFabless Semiconductor Association (FSA) Design Modeling Workshop, Santa Clara, CA, Oct. 11-12, 2000INVITED TUTORIAL
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Advanced Electro-Thermal Modeling and Simulation Techniques for Deep Sub-Micron DevicesProceedings of TECHCON, Phoenix, AZ, Sept. 21-23, 2000
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3-D ICs: Motivation, Performance Analysis, and TechnologyProc. 26th European Solid-State Circuits Conference (ESSCIRC ‘2000), Stockholm, Sweden, Sept. 19 - 21, 2000INVITED
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Sub-Continuum Thermal Simulations of Deep Sub-micron Devices under ESD ConditionsIEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), pp. 54-57, Sept. 6-8, Seattle, WA, 2000 [
]
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Multiple Si Layer ICs: Motivation, Performance Analysis, and Design Implications
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3-D lCs with Multiple Si Layers: Performance Analysis, and Technology197th Meeting of The Electrochemical Society, Toronto, May 14-18, 2000INVITED
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Thermal Characteristics of Sub-Micron Vias Studied by Scanning Joule Expansion Microscopy
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Microanalysis of VLSI Interconnect Failure Modes under Short-pulse Stress Conditions38th IEEE Annual International Reliability Physics Symposium Proceedings (IRPS), pp. 283-288, San Jose, CA, April 10-13, 2000 [
]
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Quantitative Projections of Reliability and Performance for Low-k/Cu Interconnect Systems38th IEEE Annual International Reliability Physics Symposium Proceedings (IRPS), pp. 354-358, San Jose, CA, April 10- 13, 2000 [
]
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Process and Layout Dependent Substrate Resistance Modeling for Deep Sub-Micron ESD Protection Devices38th IEEE Annual International Reliability Physics Symposium Proceedings (IRPS), pp. 295-303, San Jose, CA, April 10- 13, 2000 [
]
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Performance Analysis and Technology of 3-D ICsACM International Workshop on System Level Interconnect Prediction (SLIP), pp. 85-90, San Diego, CA, April 8-9, 2000INVITED
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Thermal Effects in Deep Sub-Micron VLSI InterconnectsIEEE International Symposium on Quality Electronic Design (ISQED), San Jose, CA, March 20-22, 2000INVITED TUTORIAL
1999
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Thermal Effects in Deep Sub-micron VLSI Interconnects and Implications for Reliability and PerformanceElectronics Research Laboratory, Memorandum no. UCB/ERL M99/48, September 22, 1999
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On Thermal Effects in Deep Sub-Micron VLSI Interconnects
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Investigation of Self-Heating Phenomenon in Small Geometry Vias Using Scanning Joule-Expansion Microscopy37th IEEE Annual International Reliability Physics Symposium Proceedings (IRPS), pp. 297-302, San Diego, CA, March 23-25, 1999 [
]
1998
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Comparison of E and 1/E TDDB Model for Si02 under Long-Term/Low-Field Test ConditionsTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 171-174, San Francisco, CA, Dec. 6-9, 1998 [
]
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A New Quantitative Model for Deep Submicron Contact ResistanceProceedings of the TECHON, Las Vegas, NV, 1998
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High Current Effects in Silicide films for Sub-0.25 micron VLSI Technologies36th Proceedings of the IEEE Annual International Reliability Physics Symposium (IRPS), pp. 284-292, Reno, NV, March 30 – April 2, 1998 [
]
-
Thermal Effects in InterconnectsIEEE Annual International Reliability Physics Symposium (IRPS), Reno, NV, March 30 - April 2, 1998INVITED TUTORIAL
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Characterization of Self-Heating in Advanced VLSI Interconnect Lines Based on Thermal Finite Element SimulationIEEE Transactions on Components, Packaging, and Manufacturing Technology-A, Vol. 21, No. 3, pp. 406-411, 1998 [
]
1997
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Temperature and Current Effects on Small-Geometry-Contact ResistanceTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 115 -118, Washington DC, Dec. 7-10, 1997 [
]
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High Current Effects in Metal InterconnectsProceedings of the SRC Topical Research Conference on Reliability, Vanderbilt University, Nashville, Oct. 21-22, 1997INVITED
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Characterization of Self-Heating in Advanced VLSI Interconnect Lines Based on Thermal Finite Element Simulation3rd International Workshop on Thermal Investigations of ICs and Microstructures (THERMINIC), pp. 108-113, Cannes / Cote d'Azur, France, Sept. 21-23, 1997
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High-Current Failure Model for VLSI Interconnects Under Short-PuIse Stress Conditions
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Characterization of Contact and Via Failure under Short Duration High Pulsed Current Stress35th Proceedings of the IEEE Annual International Reliability Physics Symposium (IRPS), pp. 216-220, Denver, CO, April 8-10, 1997 [
]
-
Failure Mechanisms of Multi Layered Thin Film Metal Interconnects under a High Current PulseMRS Spring Symp., San Francisco, CA, March 31-April 4, 1997
1996
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The Effect of Interconnect Scaling and Low-k Dielectric on the Thermal Characteristics of the IC MetalTechnical Digest IEEE International Electron Devices Meeting (IEDM), pp. 65-68, San Francisco, CA, Dec. 8-11, 1996 [
]
-
The Dependence of W-plug Via EM Performance on Via Size
-
Thermal Analysis of the Fusion Limits of Metal Interconnect under Short Duration Current PulsesFinal Report, IEEE International Integrated Reliability Workshop (IRW), pp. 98-102, Lake Tahoe, CA, Oct 20-23, 1996 [
]
-
Characterization and Simulation of Self Heating in a Multi Level VLSI Interconnect System under DC and Pulsed Current ConditionsProceedings of the SRC TECHCON, Phoenix, AZ, Sept. 1996
-
Impact of High Current Stress Conditions on VLSI Interconnect Electromigration Reliability EvaluationProceedings of the Thirteenth International VLSI Multilevel Interconnection Conference (VMIC), pp. 289- 294, Santa Clara, CA, June 18-20, 1996
-
Characterization of VLSI Circuit Interconnect Heating and Failure under ESD Conditions34th Proceedings of the IEEE Annual International Reliability Physics Symposium (IRPS), pp. 237-245, Dallas, TX, April 30-May 2, 1996 [
]

