Kazuhiko Endo is a group leader in the Advanced Materials and Devices Integration Group, Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Japan. He received a PhD degree in electrical engineering from Waseda University in 1999. Subsequently, he was a visiting scholar at Stanford University in 1999. His research interests include nanometer-scale manufacturing for aggressively scaled multi-gate devices in advanced CMOS technologies. Prior to joining AIST, he was with Silicon Systems Research Laboratories, NEC Corporation from 1993 to 2003 where he worked on the research and development of multilevel interconnects and high-k gate-stack technologies for ULSI. Dr. Endo was a visiting scholar at the NRL in Universtity of California, Santa Barbara during Jan-April 2015 studying 2D materials.